| 摘要 |
PURPOSE:To facilitate peeling of highly hardened photoresist films and photoresist films subjected to heat treatment by using a composition comprising 10-30wt.% monoethanolamine, 30-60wt.% specified glycol monoalkyl ether, water of the rest. CONSTITUTION:The peeling agent composition is composed of 10-30wt.% monoethanolamine, the 30-60wt.% glycol monoalkyl ether represented by formula I in which R is 1-5C alkyl, and p is 1, 2, or 3, and water of the rest, thus permitting the obtained peeling agent to be made noncombustible by said composition containing water, superior in operability and safety, and also peeling performance of the photoresist and easily peel the photoresist films highly hardened by high-temperature baking, or by the RIE method and far ultraviolet exposure and the like at comparatively low temperature from the substrate. |
