发明名称 MONITORING DEVICE FOR MEASURING PARTICLE BEAM
摘要 PURPOSE:To reduce the energy loss of a particle beam so that the measurement can be executed precisely by adhering a collector electrode to a resin plate by vapor-depositing a metal or performing the plating. CONSTITUTION:When the particle beam 12 passes through the inside of a housing filled with a gaseous material 3, the particle beam 12 and a molecule of the gaseous material 3 are brought into collision with each other and a gas molecule is ionized. Also, when an electric field is applied between a high voltage electrode 4 and a collector electrode 20 formed in a resin plate by vapor- depositing a metal by using a high voltage power source 7 an ionized electron e<-> and an ion i<+> are collected to the collector electrode 20 and the high voltage electrode 4, respectively. The number of ionized electrons e<-> and ions i<+> is proportional to the intensity of the passing particle beam, and the moving speed of the electron e<-> is higher than the moving speed of the ion i<+>, therefore, the electron e<-> is collected to the collector electrode 20 and measured by a measuring circuit. That is, the irradiation quantity of the particle beam 12 is measured by a dose measuring electrode 26, and the gradation of the particle beam 12 when the particle beam 12 is spread out and distributed can be measured by a flatness measuring electrode 27.
申请公布号 JPH0198985(A) 申请公布日期 1989.04.17
申请号 JP19870256975 申请日期 1987.10.12
申请人 MITSUBISHI ELECTRIC CORP 发明人 UEDA KAZUHIRO;NISHIHARA SUSUMU
分类号 G01T1/185;G01T1/29 主分类号 G01T1/185
代理机构 代理人
主权项
地址