发明名称 DEFECT INSPECTION DEVICE
摘要 PURPOSE:To know a trend of generating a defect in a process by collating and calculating a plurality of data regarding the defect position and size of an element to be inspected each other by a foreign matter inspecting means. CONSTITUTION:A reticle 1 of an element to be inspected is placed in an inspection chamber 2. Data regarding the position and size of a defect from defect detecting means 5 for detecting the defect of the element to be inspected are stored in a memory 22. A CPU 20 subtracts data in the element 1 to be inspected before a process from the data regarding the position and size of the defect in the element 1 to be inspected after the process by an arithmetic unit 23. Only the defect generated in the element 1 to be inspected can be selected in the process. Accordingly, the position and size of the defect are analyzed by the CPU 20, thereby accurately diagnosing a cause or the like of generating the defect in the process.
申请公布号 JPH01137641(A) 申请公布日期 1989.05.30
申请号 JP19870295229 申请日期 1987.11.25
申请人 HITACHI LTD 发明人 ABE HIROSHI;MIYAMOTO YOSHIYUKI;OGINO MASAYOSHI
分类号 G01N21/88;G01N21/94;G01N21/956;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
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