| 发明名称 |
METHOD OF PREPARING SUBSTRATE HAVING PATTERN FORMED THEREON |
| 摘要 |
A method of preparing a substrate having a pattern of a high-resolution formed thereon by irradiating a resist-coated substrate through a mask with a beam having a wavelength shorter than 300 nm at a dose smaller than 2 J/cm<2>. |
| 申请公布号 |
WO8907787(A1) |
申请公布日期 |
1989.08.24 |
| 申请号 |
WO1989JP00152 |
申请日期 |
1989.02.15 |
| 申请人 |
TERUMO KABUSHIKI KAISHA |
发明人 |
MURAHARA, MASATAKA;SHIMOMURA, TAKESHI;TAKAHASHI, TOHRU |
| 分类号 |
G11B7/26;G03F7/039;G03F7/20 |
主分类号 |
G11B7/26 |
| 代理机构 |
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代理人 |
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