| 摘要 |
NEW MATERIAL:A compound expressed by the formula (R<1>, R<2> and R<3> represent lower alkyl, aryl or H; X represents halogen atom or lower alkoxy; m is 0, 1 or 2; n is an integer of 10-30). EXAMPLE:19-Trimethylsilyl-18-nonadecynyltrichlorosilane. USE:An organosilicon compound used for a formation of a functional monomolecular layer or laminated layer on an inorganic solid surface. PREPARATION:A compound expressed by the formula R<1>R<2>R<3>SiCidentical C(CH2)nY (Y represents halogen) is reacted in the presence of both metallic magnesium and diethyl ether, etc., as a solvent in a reactor equipped with a stirrer and a reflux cooler at about 10-60 deg.C to afford a Grignard reagent, which is further reacted with a compound expressed by the formula (CH3)mSiX4-m in a solvent such as toluene in a reactor similar to that mentioned above at a reaction temperature of about 0-40 deg.C. After finishing the reaction, a magnesium salt and the solvent are distilled off to afford the aimed compound.
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