发明名称 Thin film manufacturing system
摘要 A thin film manufacturing system comprises a reaction vessel with a window that is transparent to ultraviolet radiation; a means of exhausting gas from the reaction vessel to a reduced pressure condition, a means of introducing a gas into the reaction vessel to form a thin film, a source of ultraviolet radiation that activates the gas, and slits provided at a predetermined interval on the window that is transparent to ultraviolet radiation.
申请公布号 US4887548(A) 申请公布日期 1989.12.19
申请号 US19880193680 申请日期 1988.05.13
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 URATA, KAZUO;HIROSE, NAOKI;HAYASHI, SHIGENORI
分类号 H01L21/31;C23C16/34;C23C16/48;H01L21/205 主分类号 H01L21/31
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