| 摘要 |
PURPOSE: To enhance the contrast and selectivity of a pattern by incorporating a specified arom. polycyclic sulfonic acid (salt) or arom. polycylic carboxylic acid (salt). CONSTITUTION: This compsn. contains a phenolic resin, a diazoquinone compd. and free arom. polycyclic sulfonic acid or carboxylic acid (A) and/or its ammonium salt (B) and/or its halide. When the salt B is contained, a component represented by the formula is used as the cation of the salt B and an acid other than amino acids is used as the acid component. In the formula, each of R1 -R4 is H, a 1-4C alkyl, etc. Naphthalenesulfonic acid, naphthalenecarboxylic acid, diazoquinonesulfonic acid or diazoquinonecarboxylic acid is preferably used as the acid A. After a layer of this compsn. is exposed to UV, a protective layer is preferably formed by selectively adding an Si compd. |
