| 摘要 |
PURPOSE:To enable development of a resist with water or an aqueous solution of dilute acid by incorporating a specified aromatic epoxy resin derivative. CONSTITUTION:The title composition is composed essentially of the aromatic epoxy resin derivative having a 0.3-10mol polymerizable unsaturated group, a photopolymerization initiator, and a 0.1-3mol group containing aprotic onium salt represented by formula I in which R1 is hydroxy, alkoxy, or the like; W<+> is a group of formula II or III; Z is N or P; Y is S; and each of R2-R4 is a 1-14 C organic group, A base plate is coated with said composition and hardened by illuminating it with activated rays, heat treated, then, exposed to the activated light past a mask, developed with water or an aqueous solution of dilute acid, and again heat treated, and thus the resist pattern is formed. |
