发明名称 POSITIVE TYPE PHOTORESIST
摘要 PURPOSE: To improve the resolution of a resist and to make the slope of an edge remarkably sharp by incorporating a specific photosensitive compound and a compound for accelerating developing rate. CONSTITUTION: An alkali soluble resin (a), 1,2-naphthoquinone-diazide-5-sulfonyl ester (b) of trihydroxybenzene isomer and an aromatic hydroxy compound (c) are blended. The component (b) is blended so as to be at least 0.5μm<-1> in absorption coefficient to light fading absorption and the component (c) is blended so as to be 15-30wt.% of total solid. As the component (b), 1,2-naphthoquinone- diazide-5-sulfonyl trisester of 1,3,5-trihydroxy benzene is preferably used, as the component (c), 2,3,4,-trihydroxybenzophenone or the like is preferably used, and as the component (a), the novolak resin or the like can be used.
申请公布号 JPH0210350(A) 申请公布日期 1990.01.16
申请号 JP19890083879 申请日期 1989.03.31
申请人 CIBA GEIGY AG 发明人 RAINHARUTO SHIYURUTSU;HORUSUTO MUYUNTSUERU
分类号 G03F7/023;G03F7/022 主分类号 G03F7/023
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