发明名称 RESIST DEVELOPING DEVICE
摘要 PURPOSE:To accurately develop a fine pattern with high reproducibility by providing a temperature controlling means which keeps the atmosphere of a developer, a substrate, and inside of sealed space at fixed temperature. CONSTITUTION:By the working of a hot water pipe 13, a temperature control system 12, and a temperature sensor 11, the temperature of the wall of a chamber 1 is kept. By the working of a hot water drum 21 and the temperature control system 12, the temperature of the developer 7 is kept. By the working of an infrared ray lamp 9 and the temperature control system 12, the temperature of the substrate 4 and the atmosphere of the lower part 1b of the chamber 1 is kept. By these controlling means, the developer 7, the substrate 4, and the atmosphere of the lower part 1b inside of the chamber 1 are controlled, e.g., at 23 deg.C. Thus, since development is performed at the fixed temperature, a fine pattern can be accurately developed with high reproducibility.
申请公布号 JPH0213958(A) 申请公布日期 1990.01.18
申请号 JP19880165609 申请日期 1988.06.30
申请人 MITSUBISHI ELECTRIC CORP 发明人 MATSUDA SHUICHI
分类号 G03D5/00;G03D5/04;G03F7/30 主分类号 G03D5/00
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