发明名称 MAKING OF RADIATION SENSITIVE MIXTURE AND RELIEF PATTERN
摘要 PURPOSE: To develope a radiation sensitive mixture with an alkali aq. solution and to increase transparency in a short wave ultraviolet range by blending a specific polymer binder with a specific organic compound. CONSTITUTION: The mixture contains the polymer binder (A) soluble in the alkali aq. solution and the organic compound (B) having a group to be increased in the solubility to the water based alkali developer by an acid and to be split by the acid and a group forming a strong acid by radiation. And as the component A, a polymerization (condensation) product containing 5-35mol% monomer (a) having an acid unstable group (e.g. t-butyl carbonate group) or the polymerization product in which the quantity of the acid unstable group is introduced is used. In such a case, as the component (A), a copolymer of a novolak, p- hydroxystyrene or the like and the component (a) is preferably used and as the component (B), a compound expressed by a formula is preferably used. Where in the formula, each of R<1> -R<3> expresses an aliphatic, an aromatic group or the like and X↑O-expresses hexafluoroarsenate or the like.
申请公布号 JPH0218564(A) 申请公布日期 1990.01.22
申请号 JP19890109276 申请日期 1989.05.01
申请人 BASF AG 发明人 RAINHORUTO SHIYUBUARUMU;HORUSUTO BINDAA;ANDOREASU BETSUCHIYAA
分类号 G03F7/004;G03F7/039 主分类号 G03F7/004
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