发明名称 CHARGED BEAM DRAWING METHOD
摘要 PURPOSE:To enable a pattern containing a plurality of kinds of graphics which are enlarged or reduced by an appropriate ratio in XY axial directions to be continuously drawn by a method wherein a drawing start position, and a scan width and scan interval of a charged beam are controlled by positional information for each graphic and besides, ON and OFF of the charged beam are performed by graphic information. CONSTITUTION:A bit conversion unit 52 converts graphic information expressed by a specific format to a bit pattern data. A purpose of a deflection control unit 53 is to make an electron beam 17 scan according to transfer (positional) of a sample 10, and its scan width is suitably altered by a command from a CPU 40. A positional measurement unit 54 detects a position of the sample 10 with an X laser length measuring machine 15 and a Y laser length measuring machine not given in the figure, and outputs a deflection start command to the deflection control unit 53 following an indication from the CPU 40. Besides, the positional measurement unit 54 outputs a command for reading the bit pattern data prepared with the bit conversion unit 52.
申请公布号 JPH0281700(A) 申请公布日期 1990.03.22
申请号 JP19880234638 申请日期 1988.09.19
申请人 TOSHIBA MACH CO LTD 发明人 GOTO TAISAN;WAKASAKI KUNIYOSHI
分类号 B41J3/407;B41J2/49;B43L13/00;G03F7/20;H04N1/387;H04N1/393 主分类号 B41J3/407
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