| 摘要 |
PURPOSE: To provide a composition effective for commercial use and enhancing the safely of working site by developing a photosensitive material, developable conventionall only with an organic solvent, by using a water-based developer composition consisting of a surfactant, a specific quantity by wt.% of a terpene and water. CONSTITUTION: The composition consists of 0.5-10wt.% surfactant, 0.2-10wt.% terpene and water. More preferably the composition consist of 3-6wt.% nonionic surfactant or the mixture as the surfactant, 4-8wt.% d-limonene as the terpene and the balance water. A resist image of a polymer material is formed by screen-printing an optically image forming solder mask on a printed circuit board, image-exposing with activated beam and washing out the unexposed part with the composition. The safety is secured by replacing a harmful volatile organic solvent such as trichloroethylene, which has been conventionally used in the developing process, with the water based developer composition. |
