PHOTOSENSITIVE A-SI BODY AND PRODUCTION THEREOF

摘要

PURPOSE:To improve water repellency and to obviate the deterioration by corona irradiation by subjecting a low-carbon content a-SiC:H film which is the surface protective layer of the photosensitive a-Si body to a treatment to convert the surface of the film to trimethyl silyl. CONSTITUTION:The low-carbon content a-SiC:H film which is the surface protective layer of the photosensitive a-Si body is subjected to the treatment and is thereby made into the constitution in which the trimethyl silyl groups are attached to the Si atoms exposed on the surface. The photosensitive a-Si body having the a-SiC:H film subjected to the trimethyl silyltion treatment in such a manner as its surface protective layer has the enhanced water repellency and has the effect of not generating 'image flowing' at and under high temp. and high humidity. A significant contribution is thus made to the improvement in the environmental characteristics of the photosensitive a-Si body and the deterioration thereof by the corona irradiation is obviated.