| 摘要 |
PURPOSE: To increase the sensitivity and the resolution of a positive resist and to eliminate the generation of scum by using a composition containing a specific dye and a specific photosensitive activated component. CONSTITUTION: The composition is composed preferably of a solid material of an alkali water soluble polymerization resin, that is an alkali soluble phenol resin (A), an organic photo acid, that is the photosensitive activated component (B), and the quantity of a bis(phenylzao)resorcinol dye (C) enough to improve lithograph image forming ability on a non-flat reflective substrate and expressed by formula I and a solvent. The solid material contains preferably 75-92% mixture of the component A with 0.4-8% component C per the component A and 8-25% component B such as oxo-diazonaphthalene sulfanate ester of polyhydroxy. ballast compound, preferably a compound expressed by formula II. Where, R in formula II expresses H or a group expressed by formula III. And the solvent, ethyl lactate or the like is preferably used. |
