发明名称 EPROM DEVICE AND MANUFACTURING METHOD THEREOF
摘要 The EPROM device has a number of memory cell FETs arranged in a matrix on a semiconductor substrate. The memory cell FET has a floating gate for storing voltage on it and controlling the conductivity of the memory cell FET, and a gate insulation film provided between the floating gate and the substrate for insulating the floating gate from the substrate. A control gate positioned over the floating gate controls the voltage of the floating gate. Device separation regions provided on both sides in gate width direction of the floating gate separate the memory cell FET from adjacent memory cell FETs on both sides.
申请公布号 KR900003875(B1) 申请公布日期 1990.06.02
申请号 KR19870000077 申请日期 1987.01.08
申请人 FUJITSU CO LTD 发明人 SGATANI SINGI
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115 主分类号 H01L21/8247
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