发明名称 Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
摘要 The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a solvent mixture comprising propylene glycol alkyl ether and propylene glycol alkyl ether acetate, onto a substrate, drying, exposing to imaging energy and developing.
申请公布号 US4948697(A) 申请公布日期 1990.08.14
申请号 US19890376147 申请日期 1989.07.05
申请人 HOECHST CELANESE CORPORATION 发明人 DURHAM, DANA
分类号 G03F7/004;G03F7/022 主分类号 G03F7/004
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