发明名称 LAMINATE AND SUPPORT MATERIAL OF MEMBER TO BE POLISHED AND POLISHING CLOTH USED THEREWITH
摘要 PURPOSE:To obtain laminate, which can be used as the support material of member to be polished, polishing cloth and the like, by a method wherein foaming layer composition, which has urethane polymer, a kind of vinyl polymer and dimethylformamide, is provided directly onto substrate and, after that, foamed layer is produced by wet solidifying method. CONSTITUTION:The dimethylformamide solution of vinyl polymer is prepared by mixing vinyl polymer B with dimethylformamide C. Next, foaming layer composition is prepared by mixing the solution as just mentioned above with the dimethylformamide solution of urethane polymer A and applied onto one surface of a substrate having flat surfaces. After that, by processing the resultant substrate by wet solidifying method, a foamed layer 1, which consists of lower foam and on the surface of which a hard film layer or skin layer is formed, is obtained. By removing the skin layer by buffing, the surface part of the foamed layer 1 is cut off flat, resulting in producing a large number of holes 1a having open top surface.
申请公布号 JPH02220838(A) 申请公布日期 1990.09.04
申请号 JP19890042856 申请日期 1989.02.22
申请人 RODEELE NITTA KK 发明人 ITO TERUNAO
分类号 B24D11/00;B32B5/18;B32B27/30;B32B27/40;H01L21/304 主分类号 B24D11/00
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