METHOD FOR EPITAXY,申请号JP19890089021-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	METHOD FOR EPITAXY
摘要
申请公布号	JPH02267186(A)	申请公布日期	1990.10.31
申请号	JP19890089021	申请日期	1989.04.08
申请人	SEIKO EPSON CORP	发明人	IWAMATSU SEIICHI
分类号	C30B25/02;C23C16/48;C30B23/02;C30B25/18;H01L21/20;H01L21/203;H01L21/205;H01L21/263;(IPC1-7):C30B23/02	主分类号	C30B25/02
代理机构		代理人
主权项
地址

您可能感兴趣的专利

MANUFACTURE OF PATTERNED ARTIFICIAL STONE MOLDED BODY

AUTOMATIC EMPTY CAN TREATING DEVICE

MOLD AND CASTING METHOD

CONTINUOUS FORGING PRESS EQUIPMENT FOR CONTINUOUSLY CAST INGOT

AUTOMATIC SETUP DEVICE FOR NUMERICALLY CONTROLLED MACHINE TOOL

AIR CYLINDER FOR AIR CHUCK

METHOD AND APPARATUS FOR SQUEEZING MOLTEN METAL

METHOD FOR AUTOMATICALLY INSERTING MATERIAL IN HIGH SPEED PRESSING MACHINE

METHOD FOR PRESS BENDING COMPOSITE PART

CROWN ADJUSTING ROLL

METHOD AND DEVICE FOR ROLLING BY MANDREL MILL

METHOD FOR PREVENTING SURFACE CRACKING IN HOT ROLLING OF CONTINUOUS CAST BILLET

FRICTION MATERIAL AND PRODUCTION THEREOF

LUBRICATING RESIN TREATED STEEL PANEL EXCELLENT IN PRESS MOLDABILITY AND PROCESSED PART CORROSION RESISTANCE

WORK FEEDING JIG

DEVICE FOR REMOVING DEPOSITED PAINT

DEVICE FOR MOLDING STATIC PRESSURE MOLD

DISK ASSEMBLING BODY