发明名称 Quantum effect semiconductor device
摘要 A quantum effect semiconductor device a channel layer which is substantially a non-doped semiconductor and an n-type (or p-type) carrier supplying layer which is formed on a substrate and having a smaller electron affinity than the channel layer, and an n-type (or p-type) cap layer selectively formed on the carrier supplying layer so that an electron gas layer is formed only at a portion of the channel layer which is immediately under the cap layer.
申请公布号 US4989052(A) 申请公布日期 1991.01.29
申请号 US19880207991 申请日期 1988.06.17
申请人 FUJITSU LIMITED 发明人 OKADA, MAKOTO;YOKOYAMA, NAOKI
分类号 H01L29/201;H01L21/306;H01L21/335;H01L21/338;H01L29/06;H01L29/15;H01L29/205;H01L29/775;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L29/201
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