发明名称 |
Quantum effect semiconductor device |
摘要 |
A quantum effect semiconductor device a channel layer which is substantially a non-doped semiconductor and an n-type (or p-type) carrier supplying layer which is formed on a substrate and having a smaller electron affinity than the channel layer, and an n-type (or p-type) cap layer selectively formed on the carrier supplying layer so that an electron gas layer is formed only at a portion of the channel layer which is immediately under the cap layer.
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申请公布号 |
US4989052(A) |
申请公布日期 |
1991.01.29 |
申请号 |
US19880207991 |
申请日期 |
1988.06.17 |
申请人 |
FUJITSU LIMITED |
发明人 |
OKADA, MAKOTO;YOKOYAMA, NAOKI |
分类号 |
H01L29/201;H01L21/306;H01L21/335;H01L21/338;H01L29/06;H01L29/15;H01L29/205;H01L29/775;H01L29/778;H01L29/78;H01L29/812 |
主分类号 |
H01L29/201 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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