ION BEAM ASSISTED VAPOR DEPOSITION DEVICE AND METHOD THEREOF,申请号JP19890220801-传众专利搜索

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发明名称	ION BEAM ASSISTED VAPOR DEPOSITION DEVICE AND METHOD THEREOF
摘要
申请公布号	JPH0382756(A)	申请公布日期	1991.04.08
申请号	JP19890220801	申请日期	1989.08.28
申请人	MATSUSHITA ELECTRIC WORKS LTD	发明人	KITAMURA KEIMEI;NAKAJIMA KUNJI;MIYANO TAKAHIRO
分类号	C23C14/32;C23C14/48	主分类号	C23C14/32
代理机构		代理人
主权项
地址

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