| 摘要 |
An optical system, apparatus and method for analyzing samples includes a radiant energy source, a first mask, a first mirror system, a sample plane, a second mirror system, a second mask and a detector. The first and second masks are respectively positioned along the optical path of the system in the same or different Fourier planes and/or conjugate planes thereof. The first mask has at least one inlet aperture with the relative position thereof in the first mask determining the angle of the energy incidence onto the sample. The second mask has at least one outlet aperture therein passing radiant energy therethrough which has been reflected from or transmitted through the sample at a preselected angle determined by the relative position of the second aperture in the second mask. Numerous first and second masks respectively having inlet and outlet apertures at different radial and/or circumferential positions may be used in the optical system to perform many types of analyses without moving or specially preparing the sample.
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