发明名称 MANUFACTURE OF SHADOW MASK
摘要 <p>PURPOSE:To eliminate need of a drying process for simplifying manufacturing, and prevent occurrence of environmental problems or defective products by using UV-ray hardening type resin composite material for material of an etching resistant layer applied to and filled in a recessed hole. CONSTITUTION:A drying process is omitted by using UV-ray hardening type resin for resin composite material to be applied to be an etching resistant layer 12. For example of the etching resistant layer 12 to be applied to and filled in a recessed hole 10 formed in a first etching process, UV-ray hardening type resin composite material is used. By radiating UV rays immediately after applying the etching resistance material 12, the etching resistance layer 12 of a constant and sufficient film thickness can be formed stably. Processes are simplified because need of a drying process is eliminated, and environmental problems and problems of defective products are prevented.</p>
申请公布号 JPH03272538(A) 申请公布日期 1991.12.04
申请号 JP19900072875 申请日期 1990.03.22
申请人 DAINIPPON PRINTING CO LTD 发明人 ASAHI KOICHI
分类号 G03F1/00;H01J9/14 主分类号 G03F1/00
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