发明名称 LASER LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To provide a laser lithography equipment which is contrived to draw up lithography having stable line width by a method wherein an output of laser beams to be supplied to an optical head is controlled by output control means corresponding to such a speed that the optical head and an object to be processed relatively move. CONSTITUTION:A laser 101 for writing which is emitted from an He-Cd laser tube 1 is power-servoed by an AOM 3 for power control, a laser power monitor 4, and a power-servo circuit 15. Namely, a sliding movement speed with respect to an X slide 13 and a Y slide 14 is detected by a power-servo circuit 15, and based on the results of the detection, an output of the laser 101 for writing is adjusted corresponding to the speed by the AOM 3 for power control. The laser 101 for writing, in which this laser output is adjusted, is modulated by an AOM 5 for signal modulation and is provided to the optical head 12 to be emitted to an object to be processed. At this time, in order to focalize the laser 101 for writing on the object to be processed, a laser 102 for focus-servo is employed.
申请公布号 JPH0410611(A) 申请公布日期 1992.01.14
申请号 JP19900113595 申请日期 1990.04.27
申请人 NTN CORP 发明人 KOIKE TAKASHI
分类号 G02B26/10;H01L21/027;H01S3/10;H01S3/101 主分类号 G02B26/10
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