| 摘要 |
PURPOSE:To obtain an exposure device, which can conduct the control of exposure with high accuracy and exposure, by providing a condensing means condensing pulsed beam at the focal position of a relay optical system and forming the opening section of a diaphragm mechanism near the focal position in the relay optical system. CONSTITUTION:One part of a pulsed beam is shielded on the rear-side focal plane of a condenser lens system 2. The amount (intensity) of pulse beam projected to a lighting unit 4 is reduced as the result of the light-shielding of one part of pulse beam by a diaphragm mechanism 11 with a light-shielding member and an opening section, but the intensity distribution shape of luminous flux at a position in relationship approximately conjugate to the exit port of a light source 1 is hardly changed by the uniformity of the angular distribution of pulse beam in the vicinity of the exit port of the light source 1. The exit port of the light source 1 and the plane of optical incidence of an optical integrator 4b are conjugated mutually by the relay systems 2, 3. Consequently, exposure per one pulse can be reduced without deteriorating the optical performance of an exposure device such as the magnitude of an effective light source, illuminance distribution on a mask surface, etc. Accordingly, an error with quantization getting trouble on conventional pulse exposure is reduced, and exposure can be controlled with high accuracy. |
