ETCHING AND DEVELOPING METHOD

摘要

PURPOSE:To etch or develop the entire surface of a substrate by moving the substrate placed on a conveyor, oscillating a liq. chemical pipeline having a nozzle and an air pipeline having a nozzle and simultaneously injecting the chemical and air. CONSTITUTION:A liq. chemical pipeline 1 having plural nozzles 2 is arranged in plural columns in the traveling direction (to the (a) direction in the figure) of a conveyor 5 for a substrate 4. An air pipeline 6 having nozzles 7 is arranged in plural columns A-F in parallel with the chemical pipeline 1. The chemical pipeline 1 and the air pipeline 6 are oscillated, and the chemical and air are simultaneously injected on the substrate 4 respectively from the nozzles 2 and 7. Consequently, the entire surface of the substrate is uniformly etched or developed.