| 摘要 |
PURPOSE:To enable an electrodeposition bath to be used for a long period and the photoresist film to be formed in good reproducibility by incorporating a water-insoluble polymerization inhibitor in the bath. CONSTITUTION:This electrodeposition bath comprises as a dispersed phase a photosensitive resin having carboxylic groups synthesized by addition reaction of an unsaturated compound (B) having a glycidyl group with (meth)acrylic resin (A) having carboxylic groups and water and/or a hydrophilic solvent as a dispersion medium. The dispersed phase contains the water-insoluble polymerization inhibitor (C), such as diphenylpicrylhydrazyl-phenothiazine. The resin A is obtained for example, by copolymerizing an unsaturated monomer, such as (meth)acrylate, with an alpha,beta-ethylenically unsaturated acid, and compounds to be used as the compound B are glycicyl (meth)acrylate, aryl glycidyl ether, and the like. |
