PRODUCTION OXIDE HIGH-TEMPERATURE SUPERCONDUCTING THIN FILM

摘要

PURPOSE:To obtain the title film in high speed while cleaning the substrate surface during its formation, by irradiating the back surface of an oxide substrate with laser beams to transmit said beams through the substrate and by irradiating a target with the transmitted beams to effect vapor deposition of the oxide onto the substrate. CONSTITUTION:Laser beams 1 generated from a laser unit 7 is irradiated on the back surface of a substrate 3 held by a substrate holder 6 and transmitted therethrough, and an oxide target 2 held by the revolvable target holder 6 movable both vertically and horizontally is irradiated with the resulting beams, thus growing the objective oxide high-temperature superconducting thin film on the substrate 3.