发明名称 MANUFACTURING METHOD OF B/M (BLACK MATRIX) IN CRT
摘要 The method for producing a black matrix is characterized by (a) forming a striped photosensitive resin film on the inside of the panel, (b) wholly coating a graphite soln. on the inside of the panel, and drying it, (c) cooling the panel with 0-30 deg.C cooling water, (d) etching the resin film of the panel with a hydrogen peroxide, and (e) spraying the inside of the panel with a pure water, and developing the black matrix. The method can improve an image quality of CRT.
申请公布号 KR920005157(B1) 申请公布日期 1992.06.27
申请号 KR19900003596 申请日期 1990.03.17
申请人 SAMSUNG ELECTRON DEVICES CO., LTD. 发明人 LIM, KI - TAEK
分类号 H01J9/20;(IPC1-7):H01J9/20 主分类号 H01J9/20
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