| 摘要 |
PURPOSE:To enhance resolution and depth of focus at the time of projecting and exposing a circuit pattern, etc. CONSTITUTION:An illuminating luminous flux from a light source 1 is split by an optical fiber 7, and the outgoing ends 7a and 7b of the optical fiber are arranged on a position decentering from an optical axis AX on a plane corresponding to the Fourier transform of a reticle pattern 14 by movable members 8a and 8b. And a reticle 13 is irradiated with the luminous flux emitted from the outgoing ends 7a and 7b through condenser lenses 10 and 12, and the image of the reticle pattern 14 is formed and projected on a wafer(photosensitive substrate) 17 by a projecting optical system 15. High resolution and the great depth of focus can be attained, and also the outgoing part can be moved in accordance with the reticle pattern. |
