发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
摘要 PURPOSE: To overlap or cross electric mutual connection with enclosed conductive areas (101 and 102) by contacting an electric conductive area, without the need for forming a contact opening passed through a coated insulating area. CONSTITUTION: A semiconductor substrate forms at least one active element. In an example shown in Figure 1, complementary (n)-channel and (p)-channel IGFETs (10 and 20) are provided. The electric conductive regions for forming gate conductive regions (101 and 102) of the insulating gate of one IGFET is formed on a first main surface of the semiconductor substrate and enclosed inside the coated insulating region. A section (100a) of the electric conductive regions (101 and 102) forms electric contact with the electric conductive regions (101 and 102) through a conductor track (205), provided on the first main surface and a relatively highly-doped semiconductor area provided adjacently to the first main surface, and a conductive passage formed by the relatively highly doped semiconductor area is provided.
申请公布号 JPH04230038(A) 申请公布日期 1992.08.19
申请号 JP19910168727 申请日期 1991.06.13
申请人 PHILIPS GLOEILAMPENFAB:NV 发明人 UIRUHERUMUSU YAKOBUSU MARIA YOSEFU JIYOSUKIN
分类号 H01L21/768;H01L21/331;H01L21/336;H01L21/8249;H01L23/48;H01L23/532;H01L23/535;H01L27/06;H01L29/417;H01L29/73;H01L29/732;H01L29/78 主分类号 H01L21/768
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