发明名称 |
SEMICONDUCTOR DEVICE AND ITS MANUFACTURE |
摘要 |
PURPOSE: To overlap or cross electric mutual connection with enclosed conductive areas (101 and 102) by contacting an electric conductive area, without the need for forming a contact opening passed through a coated insulating area. CONSTITUTION: A semiconductor substrate forms at least one active element. In an example shown in Figure 1, complementary (n)-channel and (p)-channel IGFETs (10 and 20) are provided. The electric conductive regions for forming gate conductive regions (101 and 102) of the insulating gate of one IGFET is formed on a first main surface of the semiconductor substrate and enclosed inside the coated insulating region. A section (100a) of the electric conductive regions (101 and 102) forms electric contact with the electric conductive regions (101 and 102) through a conductor track (205), provided on the first main surface and a relatively highly-doped semiconductor area provided adjacently to the first main surface, and a conductive passage formed by the relatively highly doped semiconductor area is provided. |
申请公布号 |
JPH04230038(A) |
申请公布日期 |
1992.08.19 |
申请号 |
JP19910168727 |
申请日期 |
1991.06.13 |
申请人 |
PHILIPS GLOEILAMPENFAB:NV |
发明人 |
UIRUHERUMUSU YAKOBUSU MARIA YOSEFU JIYOSUKIN |
分类号 |
H01L21/768;H01L21/331;H01L21/336;H01L21/8249;H01L23/48;H01L23/532;H01L23/535;H01L27/06;H01L29/417;H01L29/73;H01L29/732;H01L29/78 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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