| 摘要 |
PURPOSE:To prevent air bubbles from directly attaching to a photosensitive film at the time of feeding a developing solution to a substrate by forming a film soluble in the developing solution in advance before a developing process on the photosensitive film. CONSTITUTION:The resist pattern forming method is characterized by forming the film 3 soluble in the developing solution on the photosensitive film 2 formed on a substrate 1 before the process for developing the photosensitive film 2 having a latent image formed on a substrate 1. |
