| 摘要 |
PURPOSE:To provide a wafer recognition code addition device capable of stabilizing a recognition code in a specific format on a wafer for addition and preventing the generation of dust and dirt. CONSTITUTION:A resist coating section 4 coats a wafer 3 with a resist film. An exposure section 5 exposes the wafer 3 and prints the shape of a recognition code on the resist film. A resist developing section 6 develops the resist film after the exposure. An etching section 7 etches the wafer 3 with the resist film in the developing section as a mask. A resist peel section 8 peels the resist film after being etched from the wafer 3 and removes. |
