发明名称 RADIATION-SENSITIVE ESTER AND PROCESS FOR ITS PREPARATION
摘要 The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ringsubstituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D1) and (c) an (o-naphthoquinone 2-diazide)-4-or -5-sulfonic acid which is not further substituted (compound D2) and/or a non-radiation-sensitive organic acid (compound D0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.
申请公布号 CA2065475(A1) 申请公布日期 1992.10.10
申请号 CA19922065475 申请日期 1992.04.07
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 SCHELER, SIEGFRIED;ZAHN, WOLFGANG;SCHMITT, AXEL;BUHR, GERHARD
分类号 C09K9/02;C07C309/26;C07C309/71;C07C309/76;C07C311/16;C07C323/66;G02F1/065;G03F7/022;(IPC1-7):C07C309/76;C07C317/32 主分类号 C09K9/02
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