发明名称 ROTARY DEVICE FOR TREATING SUBSTRATE
摘要 PURPOSE:To accurately and easily recognize the names of liquid chemicals used for substrate treatment by displaying the names of the liquid chemicals usable for the substrate treatment in comparison with a liquid chemicals application process flow chart which indicates required treatment data correspondingly for each treatment step necessary for a specified substrate treatment procedures. CONSTITUTION:The device is provided with rotary treating machines 31, 32 by which a rotary treatment is applied to the substrates by using the required liquid chemicals and a treatment procedure storage device 54 in which plural kinds of substrate treatment procedures are stored. Based on the substrate treatment procedure specified from these plural treatment procedures, the rotary treatment is applied to the substrates by means of the rotary treating machines 31, 32 and by using treating liquids specified by the substrate treating means. Also, the device is provided with a means 54 to store the names of the treating liquids usable for treating substrates and at the display means 5b, the liquid chemicals process flow chart, indicating the required treatment data correspondingly for each treatment step necessary for the specified substrate treatment procedures which are read out from the treatment procedure storage means 54, is displayed together with the stored names of the treating liquids.
申请公布号 JPH04305268(A) 申请公布日期 1992.10.28
申请号 JP19910092943 申请日期 1991.03.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HAMADA TETSUYA;MORIMOTO TORU
分类号 B05C11/08;G03F7/30;H01L21/027;H01L21/30 主分类号 B05C11/08
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