SUPPORT DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

主权项

1. A support device configured to support a first part relative to a second part, minimising the transfer of vibration between the two parts, comprising:
a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain said gas under pressure and provide said gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within said gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.