| 摘要 |
<p>A method of making a metallic pattern on a substrate having a surface comprising bare metal in predetermined areas and metal coated with a resist in remaining areas which comprises (i) protecting the bare metal by electrodepositing thereon a heat-curable polymeric film having (a) a group which is reactive with an isocyanate group and (b) a blocked isocyanate group, and incorporating in the electrodeposited film a compound containing at least two groups selected from hydroxy, amino and carboxyl, (ii) heating the electrodeposited film to render it resistant to a solvent with which the resist is removable (iii) removing the resist from said remaining areas using a solvent which does not remove the electrodeposited polymeric film, thereby exposing metal in said remaining areas, and (iv) etching the metal exposed in step (iii) using an etchant which does not remove the electrodeposited polymeric film, thereby leaving a metallic pattern protected by the electrodeposited polymeric film.</p> |
