Apparatus and process for diamond deposition by micro wave assisted CVD.

摘要

Device for microwave plasma-assisted deposition of diamond on a substrate, which comprises a) a deposition chamber (1) part of which is placed in a waveguide (2), comprising two zones, one being the plasma formation zone (10) situated inside the waveguide (2) and the other being the diamond deposition zone (11) situated outside the waveguide (2), b) means making it possible to form a stable plasma in the deposition zone (11), so as to increase considerably the substrate area to be treated. Diamond deposition process employing the device according to the invention. Application to deposition on single-block articles of large size. <IMAGE>