APPARATUS AND METHOD FOR OBSERVATION AND LENGTHMEASUREMENT OF LSI PATTERN, ETC., WITH ELECTRON BEAM

摘要

PURPOSE:To perform a high-accuracy length-measuring operation without changing the accelerating voltage of an electron beam irrespective of the formation material of an LSI pattern and the like on the surface of a specimen under test. CONSTITUTION:When the quality of the formation material of an LSI pattern and the like on a specimen 7 under test is different, the angle of inclination of a movable stage 6 is controlled positively by using an inclination control means 11 in such a way that the S/N ratio of a prescribed secondary electronicsignal waveform can be obtained so as to correspond to the formation material of the LSI pattern and the like. Thereby, the angle of incidence of an electron beam 5 can be changed with reference to the specimen 7 under test.