| 摘要 |
PURPOSE:To allow the optical device and another optical element to be easily and exactly connected. CONSTITUTION:A thin-film layer 28 consisting of, for example, Si, is previously formed on a core layer 24 by the same process as the process for a mask at the time of forming a core 24A by etching. After an outer clad 30 is formed, a reference plane 28A is exposed on the thin-film layer 28 by etching. This reference plane 28A has an always prescribed positional relation to the core 24A and is, therefore, utilizable for positioning of an optical fiber, etc., to be connected. |
