| 发明名称 |
TREATMENT OF FLUORINE-CONTAINING GAS |
| 摘要 |
<p>PURPOSE:To treat fluorine-contg. gas used or produced in various chemical processes and discharged in an untreated state so that the gas is made harmless. CONSTITUTION:Fluorine-contg. gas to be treated is made harmless by treatment while perfectly preventing the damage of electrodes by the gas by adopting electrode-free high-frequency discharge.</p> |
| 申请公布号 |
JPH05103945(A) |
申请公布日期 |
1993.04.27 |
| 申请号 |
JP19910270783 |
申请日期 |
1991.10.18 |
| 申请人 |
MITSUI TOATSU CHEM INC |
发明人 |
NAKAJIMA SHIGEMASA;OE TAKASHI;MATSUDA TOSHINORI;ITAYA RYOHEI |
| 分类号 |
B01D53/32;B01D53/34;B01D53/68 |
主分类号 |
B01D53/32 |
| 代理机构 |
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代理人 |
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| 地址 |
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