| 摘要 |
<p>PURPOSE: To provide a system and method for forming a form on a semiconductor chip by making a radiation-sensitive layer to be exposed with an electron beam lithography device. CONSTITUTION: A design form is converted into a rectangular shape in a single process by a computer post-process program. The post-process program converts a rectangle into an edge, and the edge is classified, from a top part to a bottom part and from a left side to a right side, for processing a design form. The chain of top part edge and side part edge is formed of a classified edge until a bottom part edge which triggers replenishment is met. When replenishment is triggered, the next bottom part edge is inspected so that needles silver is not formed during the replenishment or during a future replenishment. A rectangle is generated and an area under the chain is replenished, so that the number of silvers formed during current or future replenishment is limited to a minimum. An edge process continues until all the edges are processed, and the entire design is replenished with a rectangle. Optimum replenishment is performed, so as to make silver minimum.</p> |
