发明名称 INSPECTING APPARATUS FOR FOREIGN MATTER
摘要 <p>PURPOSE:To enhance the detection ratio of foreign matter by magnifying the light detecting range of a back scattering light detecting part to an object to be inspected in a foreign matter inspecting apparatus. CONSTITUTION:Back scattering light detecting parts 5a-5d are arranged at several places on both sides of the irradiation position of the surface of an object 1 to be inspected with laser beam 3 at a predetermined angular interval. By this constitution, the back scattering beam emitted from the foreign matter on the object 1 to be inspected by the irradiation with the laser beam 3 from a projection part is detected over a wide range and the detection ratio of the foreign matter on the object to be inspected can be enhanced.</p>
申请公布号 JPH05215690(A) 申请公布日期 1993.08.24
申请号 JP19920046414 申请日期 1992.02.03
申请人 HITACHI ELECTRON ENG CO LTD 发明人 OKAWA TAKASHI;INAGAKI KATSUYASU;HACHIKAKE YASUO
分类号 G01B11/30;G01N21/88;G01N21/94;G01N21/956;G03F1/84 主分类号 G01B11/30
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