发明名称 |
INSPECTING APPARATUS FOR FOREIGN MATTER |
摘要 |
<p>PURPOSE:To enhance the detection ratio of foreign matter by magnifying the light detecting range of a back scattering light detecting part to an object to be inspected in a foreign matter inspecting apparatus. CONSTITUTION:Back scattering light detecting parts 5a-5d are arranged at several places on both sides of the irradiation position of the surface of an object 1 to be inspected with laser beam 3 at a predetermined angular interval. By this constitution, the back scattering beam emitted from the foreign matter on the object 1 to be inspected by the irradiation with the laser beam 3 from a projection part is detected over a wide range and the detection ratio of the foreign matter on the object to be inspected can be enhanced.</p> |
申请公布号 |
JPH05215690(A) |
申请公布日期 |
1993.08.24 |
申请号 |
JP19920046414 |
申请日期 |
1992.02.03 |
申请人 |
HITACHI ELECTRON ENG CO LTD |
发明人 |
OKAWA TAKASHI;INAGAKI KATSUYASU;HACHIKAKE YASUO |
分类号 |
G01B11/30;G01N21/88;G01N21/94;G01N21/956;G03F1/84 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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