ELECTROSTATIC ATTRACTING DEVICE AND PLASMA TREATMENT DEVICE

摘要

PURPOSE:To provide an electrostatic attracting device which can obtain a uniform attracting force over the entire surface of a wafer and can generate a uniform temperature distribution over the entire surface of the wafer. CONSTITUTION:A positive and a negative electrode 2 and 4 are constituted so that the electrodes 2 and 4 can be adjacent to each other and spirally spread in the peripheral direction of an electric field forming electrode 14 from the central part of the electrode 14.