In manufacturing a film capacitor, an oxygen plasma etching of a laminated or stacked film capacitor body for making electrode connection is made by a two-stage application of radio frequency power, wherein a first stage application is at a larger power and a second stage application is at a smaller power of the radio frequency.
申请公布号
DE69003552(D1)
申请公布日期
1993.11.04
申请号
DE1990603552
申请日期
1990.02.05
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., KADOMA, OSAKA, JP
发明人
KIMURA, TADASHI, HIGASHINADA-KU, KOBE CITY, 658, JP;IKEDA, TANEJIRO, NARA CITY 631, JP