| 摘要 |
PURPOSE:To fabricate with high-size-accuracy a metal mask having a recess partially, by a method wherein the recess is formed in part of a metal plate, a printing pattern is formed by the use of a photoregist 2, the metal plate is electrolytically plated, and then the metal plate and the photoregist are removed. CONSTITUTION:To fabricate a metal mask, a recess 1a is first formed by an ordinary photoetching method, etc., in the surface of a metal plate 1 to be plated, and also a photoregist 2 is formed on the surface. Then, to the upper surface of the photoregist 2 a photomask 3 on which a printing pattern is drawn is firmly joined, and the photoregist 2 is exposed to light. After the exposure, the photoregist 2 is subjected to a development process, so that the printing pattern is formed on the upper surface of the metal plate 1. Subsequently the metal plate 1 is electroplated, so that a metal layer 4 is formed on the upper surface of the metal plate 1. By removing the metal plate 1 and the photoregist 2, the metal mask which has the recess partially is completed. |
