发明名称 |
IMPROVED STEREOLITHOGRAPHY SYSTEM |
摘要 |
A stereolithography system comprises a first emitting device, a second emitting device, and a tank disposed between the first emitting device and the second emitting device. The stereolithography system may further include a drip feeder in fluid communication with the tank. The first emitting device, the second emitting device, and the tank may be aligned either horizontally or vertically. |
申请公布号 |
CA2911258(C) |
申请公布日期 |
2016.10.04 |
申请号 |
CA20142911258 |
申请日期 |
2014.05.05 |
申请人 |
SNIDER, JEFF;CASTANON, DIEGO |
发明人 |
SNIDER, JEFF;CASTANON, DIEGO |
分类号 |
B29C67/00;B29C35/08 |
主分类号 |
B29C67/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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