| 摘要 |
PURPOSE:To carry out polishing work in fine surface roughness by removing foreign matters contained in grinding liquid. CONSTITUTION:A centrifugal sparator 16 is arranged to carry out centrifugal separation on foreign matters contained in used grinding liquid 21 discharged from a surface polishing device body 15. Next, a 10mum filter unit 10 is arranged to remove the foreign matters of not less than 10mum. A 5mum filter unit 20 is also arranged to remove the foreign matters of not less than 5mum. The grinding liquid from which the foreign matters of not less than 5mum are resupplied to the surface polishing device body 15. Circulation of this grinding liquid 21 is carried out by a pump 8. In this way, when particle diameters of the forein matters contained in the grinding liquid 21 are less than 5mum, the maximum surface roughness of a polished material becomes reliably 1mum or less. |
