发明名称 Magnetic Tunnel Junctions, Methods Used While Forming Magnetic Tunnel Junctions, And Methods Of Forming Magnetic Tunnel Junctions
摘要 A method used while forming a magnetic tunnel junction comprises forming non-magnetic tunnel insulator material over magnetic electrode material. The tunnel insulator material comprises MgO and the magnetic electrode material comprises Co and Fe. B is proximate opposing facing surfaces of the tunnel insulator material and the magnetic electrode material. B-absorbing material is formed over a sidewall of at least one of the magnetic electrode material and the tunnel insulator material. B is absorbed from proximate the opposing facing surfaces laterally into the B-absorbing material. Other embodiments are disclosed, including magnetic tunnel junctions independent of method of manufacture.
申请公布号 US2016301001(A1) 申请公布日期 2016.10.13
申请号 US201514684110 申请日期 2015.04.10
申请人 Micron Technology, Inc. 发明人 Sandhu Gurtej S.
分类号 H01L43/10;H01L43/08;H01L43/12;H01L43/02 主分类号 H01L43/10
代理机构 代理人
主权项
地址 Boise ID US