SOLAR CELL AND FABRICATION METHOD THEREOF

摘要

A solar cell with high-reflectivity region and narrow etch mark is disclosed. The solar cell includes a semiconductor substrate having a first surface and a second surface, a low-reflectivity region in and on the semiconductor substrate, and an annular etch mark disposed on the first surface and surrounding the low-reflectivity region. The etch mark is located along the perimeter of the first surface and has an average width that is not greater than 2 mm. The second surface is a surface with high reflectivity.

主权项

1. A solar cell, comprising:
a semiconductor substrate having a first surface and a second surface, the first surface comprises a low-reflectivity region and the second surface comprises a high-reflectivity region; and an etch mark formed along perimeter of the first surface and surrounding the low-reflectivity region to thereby constitute an annular pattern, wherein the etch mark has an average width that is not greater than 2 mm, wherein when the high-reflectivity region and the low-reflectivity region are irradiated with light of the same wavelength, a reflectivity of the high-reflectivity region is greater than that of the low-reflectivity region.